Reactive vapor deposition and electrochemical performance of nano-structured magnesium silicide on silicon and silicon carbide substrates
Reactive vapor deposition and electrochemical performance of nano-structured magnesium silicide on silicon and silicon carbide substrates
复制标题
硅和碳化硅基底上纳米结构硅化镁的反应气相沉积及其电化学性能
DOI:
10.1016/j.mssp.2014.09.003
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发表时间:
2014-11
影响因子:
4.1
通讯作者:
Junhua Hu
中科院分区:
文献类型:
--
作者:
Zhenya Fu;Guosheng Shao;H. Tatsuoka;Junhua Hu
A nanostructured magnesium silicide (Mg2Si) was fabricated via heating SiC substrate in an Mg vapor by reactive deposition techniques and characterized by Scanning electron microscopy (SEM) and X-ray Diffractometer (XRD). The electrochemical performances were tested by a galvanostatically charge/discharge method. A maximum discharge capacity of 365 mA h/g was measured by Mg2Si nanoparticle electrode with a good cycle performance. A Mg2Si thin film was also prepared by the reaction of Si substrate with Mg vapor for comparison. The Mg2Si film showed a high initial discharge capacity up to 2238 mA h/g. However, the capacity decayed quickly to less than 20 mA h/g after 20 cycles. This work provides a feasible way to fabricate the silicide based nanostructured materials for Li ion battery.
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影响因子:
2.1
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通讯作者:
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影响因子:
29.4
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作者:
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影响因子:
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作者:
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通讯作者:
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影响因子:
5.4
作者:
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通讯作者:
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