Rowland ghost suppression in high efficiency spectrometer gratings fabricated by e-beam lithography.
Rowland ghost suppression in high efficiency spectrometer gratings fabricated by e-beam lithography.
复制标题
通过电子束光刻制造的高效光谱仪光栅中的罗兰重影抑制。
作者：
M. Heusinger;M. Banasch;U. Zeitner
本文报道了改善电子束光刻双谱仪光栅杂散光性能的不同方法。特别地，我们报告了对杂散光峰（也称为“罗兰鬼”）的优化问题。众所周知，这些罗兰鬼产生于制造大面积光栅所需的特殊子区域的非优化拼接过程。减少拼接误差影响的一种方法是“多通曝光”技术。此外，还研究了通过特殊的校准参数直接提高拼接精度的可能性。在这两种情况下，对杂散光性能的影响都是通过角度分辨散射测量来确定的。结果表明，电子束写入器的特定校准参数对罗兰鬼的强度有很大的影响，并且它们的重新校准与适应的写入制度相结合可以显着降低峰值。
In this paper we report different methods to improve the stray light performance of binary spectrometer gratings fabricated by electron beam lithography. In particular, we report the optimization concerns about spurious stray light peaks, also known as "Rowland ghosts". As already known these Rowland ghosts arise from a non-optimized stitching process of special subareas needed in order to fabricate large area gratings. One approach to reduce the impact of the stitching errors is the technique of "multi-pass-exposure" (MPE). Furthermore, the potential of a direct improvement of the stitching accuracy via special calibration parameters is examined. In both cases the effects on the stray light performance were determined by angle resolved scattering measurements. The achieved results show that specific calibration parameters of an e-beam writer have a strong influence on the strength of the Rowland ghosts and that their recalibration combined with an adapted writing regime reduces the peaks significantly.