Sputtered permanent Nd-Fe-B magnets
Sputtered permanent Nd-Fe-B magnets
复制标题
溅射永磁 Nd-Fe-B 磁体
DOI:
10.1016/0304-8853(93)90045-4
复制
发表时间:
1993
影响因子:
2.7
通讯作者:
V.Yu. Tsvetkov
中科院分区:
文献类型:
--
作者:
B. A. Kapitanov;N. Kornilov;Ya.L. Linetsky;V.Yu. Tsvetkov
The sputtering methods widely used in microelectronics can also be applied to obtain magnetic systems and miniature magnets. Hill and Birtwistle [l] described magnetoresistive sensors with PtCo thin-film sputtered magnets. In refs.[2, 3] the magnetic systems of SHF instruments with sputtered magnets from SmCo, and Sm,(Co, Fe, Cu),, alloys were given; and in refs. 1451 it was shown that in SmCo, and Sm&, alloys it is possible to create a good crystalline texture and a corresponding uniaxial magnetic anisotropy in the plane of sputtering. According to published data [6], the type of anisotropy in Nd-Fe-B alloy films obtained by the selective thermalized sputtering method depends on the sputtering rate. With a sputtering rate of less than 0.65 pm/h perpendicular anisotropy caused by the axial crystal texture is formed, while with a sputtering rate of more than 0.65 urn/h magnetic anisotropy with easy-axis magnetization appears in the film plane. The authors of ref.[7], however, concluded that perpendicular anisotropy in Nd-Fe-B films can be obtained not only with low sputtering rates over a heated substrate, but also with high sputtering rates (more than 10 pm/h). The high