An Analytic Geometry-Variant Approach to Line Ratio Enhancement above the Optically Thin Limit
An Analytic Geometry-Variant Approach to Line Ratio Enhancement above the Optically Thin Limit
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一种将线比增强到光学薄极限以上的解析几何变体方法
DOI：
10.1086/429881
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发表时间：
2005
期刊：
影响因子：
--
通讯作者：
F. Keenan
中科院分区：
文献类型：
--
作者：
F. M. Kerr;S. Rose;J. Wark;F. Keenan
我们描述了一个简单的理论模型来研究不透明度对谱线比的异常影响，如以前在Fe XV和Fe XVII等元素中所研究的那样。开发的模型是通用的：它不是特定于一个特定的原子系统，从而使一些日冕和色球等离子体的适用性;此外，它可以应用于各种天体物理学相关的几何形状。分析的基础是几何参数，我们概述了一种技术，它被用来作为一种工具，在遥远的天体物理对象的等离子体几何形状的明确诊断。
We describe a simple theoretical model to investigate the anomalous effects of opacity on spectral line ratios, as previously studied in elements such as Fe XV and Fe XVII. The model developed is general: it is not specific to a particular atomic system, thus giving applicability to a number of coronal and chromospheric plasmas; furthermore, it may be applied to a variety of astrophysically relevant geometries. The analysis is underpinned by geometrical arguments, and we outline a technique for it to be used as a tool for the explicit diagnosis of plasma geometry in distant astrophysical objects.