Hybrid silicon evanescent laser fabricated with a silicon waveguide and III-V offset quantum well

Hybrid silicon evanescent laser fabricated with a silicon waveguide and III-V offset quantum well
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DOI:
10.1364/opex.13.009460
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发表时间:
2005-11-14
期刊:
影响因子:
3.8
通讯作者:
Bowers, JE
Bowers, JE
中科院分区:
物理与天体物理2区
文献类型:
--
作者:
Park, H;Fang, AW;Bowers, JE

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一种新型的激光器,利用硅波导键合到AlGaInAs量子威尔斯的演示。这种晶圆级制造方法允许光波导由CMOS兼容的硅工艺限定,而光增益由III-V族材料提供。采用低温氧等离子体辅助晶片键合将AlGaInAs量子阱结构键合到硅晶片上。光泵1538 nm激光器的脉冲阈值为30 mW,输出功率为1.4 mW。(c)2005年,美国光学学会。
A novel laser that utilizes a silicon waveguide bonded to AlGaInAs quantum wells is demonstrated. This wafer scale fabrication approach allows the optical waveguide to be defined by CMOS-compatible silicon processing while optical gain is provided by III-V materials. The AlGaInAs quantum well structure is bonded to the silicon wafer using low temperature oxygen plasma-assisted wafer bonding. The optically pumped 1538 nm laser has a pulsed threshold of 30 mW and an output power of 1.4 mW. (c) 2005 Optical Society of America.