Plasma chemical vapor deposition of hydrocarbon films: The influence of hydrocarbon source gas on the film properties
Plasma chemical vapor deposition of hydrocarbon films: The influence of hydrocarbon source gas on the film properties
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碳氢化合物薄膜的等离子体化学气相沉积：碳氢化合物源气体对薄膜性能的影响
DOI：
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发表时间：
1999
期刊：
影响因子：
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通讯作者：
W. Jacob
中科院分区：
文献类型：
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作者：
T. Schwarz;A. Keudell;W. Jacob
采用电子回旋共振等离子体沉积技术，以不同的烃源气体为原料，在不同的离子能量下制备了烃膜。使用的源气体是饱和烃CH 4、C2H6、C3H8、C4H10（正和异）和不饱和烃C2H4和C2H2以及这些气体与氢气的混合物。薄膜沉积进行了分析，在原位的实时椭圆偏振仪，和所得到的膜异位离子束分析。在大范围的沉积参数研究的基础上，烃源气体，沉积参数，和膜性能之间的相关性被确定。薄膜的性质被发现在很宽的范围内不仅由撞击离子的能量，而且通过源气体的选择的影响。这与广泛接受的研究相反，在该研究中没有观察到膜性质对源气体的依赖性，这被归因于“记忆丧失效应”。一个强相关性被发现之间的氢含量的膜…
Hydrocarbon films were prepared by electron cyclotron resonance plasma deposition from different hydrocarbon source gases at varying ion energies. The source gases used were the saturated hydrocarbons CH4, C2H6, C3H8, C4H10 (n- and iso-) and the unsaturated hydrocarbons C2H4 and C2H2 as well as mixtures of these gases with hydrogen. Film deposition was analyzed in situ by real-time ellipsometry, and the resulting films ex situ by ion-beam analysis. On the basis of the large range of deposition parameters investigated, the correlation between hydrocarbon source gas, deposition parameters, and film properties was determined. The film properties are found to be influenced over a wide range not only by the energy of the impinging ions, but also by the choice of source gas. This is in contrast to a widely accepted study where no dependence of the film properties on the source gas was observed, this being ascribed to a “lost-memory effect.” A strong correlation was found between the hydrogen content of the film...