Interaction between diffusion and chemical stresses
Interaction between diffusion and chemical stresses
复制标题
DOI：
10.1016/j.msea.2005.05.117
复制
发表时间：
2005-11
期刊：
影响因子：
6.4
通讯作者：
Fuqian Yang
中科院分区：
文献类型：
--
作者：
Fuqian Yang
目前的工作研究化学应力和扩散之间的相互作用。建立了静水应力与溶质原子浓度之间的新关系。对于不受体积力作用的固体，静水应力的拉普拉斯算子与溶质原子浓度的拉普拉斯算子成正比，即静水应力与其局部平均值的偏差与局部溶质原子浓度的偏差成正比。然后导出溶质原子表面浓度、法向应力和固体表面变形之间的一般关系，其中法向应力取决于未变形表面的平均曲率和表面位移的切向分量。获得薄板中溶质原子稳态浓度的封闭解。事实证明，由于化学应力和扩散之间的相互作用，板中溶质原子的线性分布是不存在的。
The present work studies the interaction between chemical stresses and diffusion. A new relation between hydrostatic stress and concentration of solute atoms is established. For a solid free of action of body force, the Laplacian of the hydrostatic stress is proportional to the Laplacian of the concentration of solute atoms, that is, deviation of the hydrostatic stress from its local average is proportional to deviation of the local concentration of solute atoms. A general relationship among surface concentration of solute atoms, normal stress and surface deformation of a solid is then derived, in which the normal stress is dependent on the mean curvature of the undeformed surface and tangential components of the surface displacement. A closed-form solution of the steady state concentration of solute atoms in a thin plate is obtained. It turns out that linear distribution of solute atoms in the plate is non-existent due to the interaction between chemical stresses and diffusion.