Structure and Tensile Properties of Thick Single-Crystal Silver Films Formed by Vacuum Deposition
Structure and Tensile Properties of Thick Single-Crystal Silver Films Formed by Vacuum Deposition
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真空沉积单晶银厚膜的结构和拉伸性能
DOI：
10.1116/1.1315705
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发表时间：
1969
期刊：
影响因子：
--
通讯作者：
M. Fukamachi
中科院分区：
文献类型：
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作者：
S. Nagakura;K. Wakashima;M. Fukamachi
制备了厚度为0.4 ~ 7 μ m的各种表面取向的单晶银膜，并对沉积态和退火态（860° C）的薄膜进行了拉伸试验。应力-应变曲线被发现依赖于拉伸方向和膜取向。用500-kV和1-MV电子显微镜进行结构观察。在厚度大于0.2 μ的薄膜中，位错缠结在一起。位错密度约为1010/cm 2。孪晶和堆垛层错并不存在。退火使（110）和（111）膜产生亚晶，而（001）膜产生再结晶。根据拉伸方向，变形结构是不同的。根据结构观察，讨论了力学性能。
Single-crystal silver films of various surface orientations were prepared with thicknesses of 0.4–7 μ, and tensile tests were carried out for the films in as-deposited and annealed (860° C) states. Stress-strain curves were found to depend on the tensile direction and the film orientation. Structural observations were done with 500-kV and 1-MV electron microscopes. Dislocations are tangled in the as-deposited films thicker than 0.2 μ. Dislocation density is in the order of 1010/ cm2. Twins and stacking faults do not exist. The annealing causes subgrain formation in (110) and (111) films, but recrystallization in (001) films. Deformed structures are different according to the tensile directions. Based on the structural observations, the mechanical properties are discussed.