Near-field interaction of two-dimensional high-permittivity spherical particle arrays on substrate in the Mie resonance scattering domain.
Near-field interaction of two-dimensional high-permittivity spherical particle arrays on substrate in the Mie resonance scattering domain.
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DOI：
10.1364/oe.18.027226
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发表时间：
2010-12
期刊：
影响因子：
3.8
通讯作者：
Yuto Tanaka;G. Obara;Akira Zenidaka;N. Nedyalkov;M. Terakawa;M. Obara
中科院分区：
文献类型：
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作者：
Yuto Tanaka;G. Obara;Akira Zenidaka;N. Nedyalkov;M. Terakawa;M. Obara
我们描述了近场相互作用的理论和实验结果的二维（2D）阵列，高介电常数的球形粒子在基板上的米氏共振散射域的表面纳米图案化处理。当考虑基底上的Mie共振粒子的接触粒子对时，在粒子内部激发不同于单粒子模式的电磁模式，导致在粒子-基底接触点处的两个热点之间的间隙中的强度增强。对于衬底上的二维六角密排颗粒阵列，发现表现出最大增强因子的颗粒的折射率从单颗粒系统的Mie共振条件偏移。
We describe theoretical and experimental results on near-field interaction of two-dimensionally (2D) arrayed, high-permittivity spherical particles on a substrate in the Mie resonance scattering domain for surface nano-patterning processing. When a touching particle pair of Mie resonance particles on the substrate is considered, an electromagnetic mode different from the single particle mode is excited inside the particles, resulting in an intensity enhancement in a gap between two hotspots at particle-substrate contact points. As for 2D hexagonal close-packed particle arrays on the substrate, the refractive index of particle exhibiting a maximal enhancement factor for the 2D particle arrays is found to be shifted from the Mie resonance conditions for the single particle system.