Structure of ultra-thin silicon film on HOPG studied by polarization-dependence of X-ray absorption fine structure
Structure of ultra-thin silicon film on HOPG studied by polarization-dependence of X-ray absorption fine structure
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DOI：
10.1016/j.cplett.2014.01.025
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发表时间：
2014-02
影响因子：
2.8
通讯作者：
Y. Baba;I. Shimoyama;N. Hirao;T. Sekiguchi
中科院分区：
文献类型：
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作者：
Y. Baba;I. Shimoyama;N. Hirao;T. Sekiguchi
