Modulation mechanism of multi-azimuthal masks on the redistributions of focused azimuthally polarized beams.
Modulation mechanism of multi-azimuthal masks on the redistributions of focused azimuthally polarized beams.
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DOI：
10.1364/oe.23.007131
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发表时间：
2015-03
期刊：
影响因子：
3.8
通讯作者：
Peng Li;Sheng Liu;Gaofeng Xie;Tao Peng;Jianlin Zhao
中科院分区：
文献类型：
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作者：
Peng Li;Sheng Liu;Gaofeng Xie;Tao Peng;Jianlin Zhao
我们提出了一种理论模型来半定量地描述多方位掩模对方位偏振（AP）光束焦场的调制机制。通过该模型，我们不仅可以解释焦平面上偏振和强度的重新分布，还可以通过设计掩模结构参数（例如扇形光区域的对称性、面积和相位延迟）有意识地管理焦场。我们的结果可以为实现偏振、角动量和聚焦场分布的操纵提供指导。
We propose a theoretical model to semi-quantitatively describe the modulation mechanism of multi-azimuthal masks on the focal fields of azimuthally polarized (AP) beam. With this model, we cannot only explain the redistributions of the polarization and intensity at the focal plane, but also consciously manage the focal fields by designing the mask structure parameters, such as the symmetry, area, and phase retardation of the sector photic regions. Our results may supply a guideline to realize the manipulation on the polarizations, angular momenta, and the distribution of focused fields.