Micropore and nanopore fabrication in hollow antiresonant reflecting optical waveguides
Micropore and nanopore fabrication in hollow antiresonant reflecting optical waveguides
复制标题
DOI：
10.1117/1.3378152
复制
发表时间：
2010-04-01
影响因子：
2
通讯作者：
Schmidt, Holger
中科院分区：
文献类型：
--
作者：
Holmes, Matthew R.;Shang, Tao;Schmidt, Holger
我们展示了中空反共振反射光波导中微孔和纳米孔特征的制作，以创建一个可以对单个纳米粒子进行尺寸选择和检测的电学和光学分析平台。微孔(直径4微米)是通过反应离子刻蚀通过光波导的顶层SiO(2)和SiN层，在中空芯上方留下一层薄的SiN膜。利用聚焦离子束刻蚀工艺在氮化硅薄膜中形成纳米孔，这种工艺提供了对孔径大小的控制。将创建直径最小为20 nm的洞口。光学损耗测量表明，微孔并没有显著改变沿波导的损耗。(C)2010年光学仪器工程师学会。[DOI：10.1117/1.3378152]
We demonstrate the fabrication of micropore and nanopore features in hollow antiresonant reflecting optical waveguides to create an electrical and optical analysis platform that can size select and detect a single nanoparticle. Micropores (4 mu m diameter) are reactive-ion etched through the top SiO(2) and SiN layers of the waveguides, leaving a thin SiN membrane above the hollow core. Nanopores are formed in the SiN membranes using a focused ion-beam etch process that provides control over the pore size. Openings as small as 20 nm in diameter are created. Optical loss measurements indicate that micropores did not significantly alter the loss along the waveguide. (C) 2010 Society of Photo-Optical Instrumentation Engineers. [DOI: 10.1117/1.3378152]