Nanometric holograms based on a topological insulator material.
Nanometric holograms based on a topological insulator material.
复制标题
DOI：
10.1038/ncomms15354
复制
发表时间：
2017-05-18
影响因子：
16.6
通讯作者：
Gu M
中科院分区：
文献类型：
--
作者：
Yue Z;Xue G;Liu J;Wang Y;Gu M
全息术在传统的光学仪器中有着极其广泛的应用，包括光学显微镜和成像、三维显示和计量学。为了将全息术与现代低维电子器件集成，需要将全息图减薄到纳米尺度。然而，为了保持明显的相移调制，全息图的厚度通常被限制在光学波长尺度，这阻碍了它们与MEMS电子器件的集成。在这里，我们打破这一限制，实现60纳米全息图使用拓扑绝缘体材料。我们发现，纳米拓扑绝缘体薄膜作为一个本征光学谐振腔，由于其金属表面和块体的折射率不等。谐振腔的存在增强了相移，从而实现了全息成像。我们的工作为将全息术与平面电子器件集成在光学成像、数据存储和信息安全方面铺平了道路。全息图通常需要与光波长一样厚，以引入必要的光学相移，从而创建真正的三维图像。在这里，Yue等人使用高折射率拓扑绝缘体材料来创建谐振光学腔和纳米级的薄全息图。
Holography has extremely extensive applications in conventional optical instruments spanning optical microscopy and imaging, three-dimensional displays and metrology. To integrate holography with modern low-dimensional electronic devices, holograms need to be thinned to a nanometric scale. However, to keep a pronounced phase shift modulation, the thickness of holograms has been generally limited to the optical wavelength scale, which hinders their integration with ultrathin electronic devices. Here, we break this limit and achieve 60 nm holograms using a topological insulator material. We discover that nanometric topological insulator thin films act as an intrinsic optical resonant cavity due to the unequal refractive indices in their metallic surfaces and bulk. The resonant cavity leads to enhancement of phase shifts and thus the holographic imaging. Our work paves a way towards integrating holography with flat electronic devices for optical imaging, data storage and information security. Holograms generally need to be as thick as a wavelength of light to introduce the necessary optical phase shifts that create true three-dimensional images. Here, Yue et al. use a high-index topological insulator material to create a resonant optical cavity and thin holograms to the nanometre scale.