Design And Performance Of An X‐ray Undulator Beamline PF‐AR‐NW2
Design And Performance Of An X‐ray Undulator Beamline PF‐AR‐NW2
复制标题
X射线波荡器光束线PF-AR-NW2的设计与性能
DOI：
10.1063/1.1757782
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发表时间：
2004
期刊：
影响因子：
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通讯作者：
H. Kawata
中科院分区：
文献类型：
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作者：
Takashi Mori;M. Nomura;M. Sato;H. Adachi;Y. Uchida;A. Toyoshima;S. Yamamoto;K. Tsuchiya;T. Shioya;H. Kawata
设计并建造了一条用于时间分辨XAFS和/或X射线衍射实验以及高通量XAFS和/或衍射实验的X射线波荡器光束线PF‐AR‐ NW 2。插入装置是周期为40 mm的真空中波荡器，并且周期的数量为90，以便覆盖5 ~ 25 keV的能量范围。主要的光学元件是一个双晶体单色器和一个反射镜系统。双晶单色器由扁平的Si（111）晶体组成，其由液氮冷却。反射镜系统由聚焦和截止反射镜系统组成。调试工作已顺利完成。在12.4keV能量下，采用弯曲柱面镜聚焦后，束流在垂直和水平方向上的尺寸约为0.21 mm × 0.55 mm，强度为6.4 × 1012光子/s。弯曲平面镜聚焦的垂直光束尺寸约为0.06 mm。我们将其性能与光线追迹计算的值进行了比较。
An X‐ray undulator beamline PF‐AR‐NW2, which is used for time‐resolved XAFS and/or x‐ray diffraction experiments and also high‐flux XAFS and/or diffraction experiments, has been designed and constructed. The insertion device is an in‐vacuum undulator at a period of 40 mm, and the number of periods is 90 in order to cover an energy range of 5 ∼ 25 keV. Main optical components are a double‐crystal monochromator and a mirror system. The double‐crystal monochromator consists of flat Si (111) crystals, which are cooled by liquid nitrogen. The mirror system consists of focusing and cut‐off mirror systems. The commissioning has been done successfully. The focused beam size with a bent cylindrical mirror is about 0.21 mm × 0.55 mm for vertically and horizontally with the intensity of 6.4 × 1012 photons/s at 12.4 keV. The vertical beam size focused with a bent flat mirror is about 0.06 mm. We compare the performance with the values from a ray‐tracing calculation.