Nanoscale comparison of bias dependent carrier distributions in mechanically exfoliated WSe2/SiO2 and suspended WSe2 by scanning nonlinear dielectric microscopy
Nanoscale comparison of bias dependent carrier distributions in mechanically exfoliated WSe2/SiO2 and suspended WSe2 by scanning nonlinear dielectric microscopy
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通过扫描非线性介电显微镜对机械剥离 WSe2/SiO2 和悬浮 WSe2 中偏压相关载流子分布进行纳米级比较
DOI：
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发表时间：
2020
期刊：
影响因子：
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通讯作者：
and Yasuo Cho
中科院分区：
文献类型：
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作者：
Koki Takano;Kohei Yamasue;Toshiaki Kato;Toshiro Kaneko;and Yasuo Cho
