Scrutinizing the Debye plasma model: Rydberg excitons unravel the properties of low-density plasmas in semiconductors
Scrutinizing the Debye plasma model: Rydberg excitons unravel the properties of low-density plasmas in semiconductors
复制标题
仔细研究德拜等离子体模型:里德伯激子揭示了半导体中低密度等离子体的特性
DOI:
10.1103/physrevb.105.075204
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发表时间:
2021
影响因子:
3.7
通讯作者:
M. Bayer
中科院分区:
文献类型:
--
作者:
H. Stolz;D. Semkat;R. Schwartz;J. Heckötter;M. Assmann;W. Kraeft;H. Fehske;M. Bayer
For low-density plasmas, the classical limit described by the Debye-Hückel theory is still considered as an appropriate description even though a clear experimental proof of this paradigm is lacking due to the problems in determining the plasma-induced shift of single-particle energies in atomic systems. We show that Rydberg excitons in states with a high principal quantum number are highly sensitive probes for their surrounding making it possible to unravel accurately the basic properties of low-density non-degenerate electron-hole plasmas. To this end, we accurately measure the parameters of Rydberg excitons such as energies and linewidths in absorption spectra of bulk cuprous oxide crystals in which a tailored electron-hole plasma has been generated optically. Since from the absorption spectra exciton energies, as well as the shift of the single-particle energies given by the band edge, can be directly derived, the measurements allow us to determine the plasma density and temperature independently, which has been a notoriously hard problem in semiconductor physics. Our analysis shows unambiguously that the impact of the plasma cannot be described by the classical Debye model, but requires a quantum many-body theory, not only for the semiconductor plasma investigated here, but in general. Furthermore, it reveals a new exciton scattering mechanism with coupled plasmon-phonon modes becoming important even at very low plasma densities.
影响因子:
2.4
作者:
Lin, Chengliang;Roepke, Gerd;Reinholz, Heidi
通讯作者:
Reinholz, Heidi
影响因子:
3.7
作者:
Heinrich Stolz;Rico Schwartz;Julian Heckötter;Marc Aßmann;Dirk Semkat;Sjard O. Krüger;Manfred Bayer
通讯作者:
Manfred Bayer
影响因子:
64.8
作者:
Kazimierczuk, T.;Froehlich, D.;Bayer, M.
通讯作者:
Bayer, M.