Optimized molecule supply from nozzle-based gas injection systems for focused electron- and ion-beam induced deposition and etching: simulation and experiment
Optimized molecule supply from nozzle-based gas injection systems for focused electron- and ion-beam induced deposition and etching: simulation and experiment
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DOI：
10.1088/0022-3727/42/12/125305
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发表时间：
2009-06-21
影响因子：
3.4
通讯作者：
Utke, I.
中科院分区：
文献类型：
--
作者：
Friedli, V.;Utke, I.
我们模拟和测量了不同出口孔几何形状（直，斜和双穿孔）的管基喷嘴的分子撞击在一个平面基板上的近场分布。考虑到喷嘴出口处的克努森数（分子/瞬态流），采用试验粒子蒙特卡罗方法进行模拟。通过在均匀加热的基底上热分解Co-2（CO）（8）分子来测量分布。对于所有的几何形状和努森数之间的模拟和实验发现一个很好的匹配。第一次可以量化的最大可达分子流量相对于总流量离开喷嘴：对于直圆柱形管，约为7%，对于斜管，约为27%，对于双穿孔管，约为32%，所有的喷嘴都与衬底相距300 μ m，并具有400 μ m的孔径。确定了最佳的基底喷嘴角度，并量化了阴影效应。
We simulated and measured near-field distributions of molecules impinging on a flat substrate from tube-based nozzles with varying exit aperture geometries (straight, bevelled and doubly perforated). Simulations were performed with the test-particle Monte Carlo approach taking into account the Knudsen number (molecular/transient flow) at the nozzle exit. Distributions were measured via thermal decomposition of Co-2(CO)(8) molecules on a homogeneously heated substrate. For all geometries and Knudsen numbers a good match between the simulation and experiment was found. For the first time the maximum accessible molecule flux with respect to the total flux exiting the nozzle could be quantified: it is around 7% for a straight cylindrical tube, around 27% for a bevelled tube and around 32% for a doubly perforated tube, all nozzles being 300 mu m distant from the substrate and having a 400 mu m aperture. Optimum substrate-nozzle angles were determined and shadow effects quantified.