Handbook of Photomask Manufacturing Technology
Handbook of Photomask Manufacturing Technology
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DOI：
10.1201/9781420028782
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发表时间：
2005-04
期刊：
影响因子：
--
通讯作者：
Syed Rizvi
中科院分区：
文献类型：
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作者：
Syed Rizvi
前言，Syed Rizvi介绍介绍面具制作A.G. Zanzal面具编写数据准备P.J.M. van Adrichem和C.K. Kalus面具作家：概述S. Babin电子束面具作家N. saiitou激光面具作家C. Rydberg光学面具光学面具：概述N.吉冈传统光学面具S.A. Rizvi先进光学面具W. Maurer和F. Schellenberg NGL面具NGL面具：概述K.R. Kimmel和M. Lercel掩模电子束投影光刻H. Sano， S. Palmer和M. Yamabe掩模极紫外光刻P-Y。离子投影光刻技术的研究进展M. Oda和H. Yoshihara掩膜加工、材料和薄膜掩膜基片s.a Rizvi电阻用于掩膜制作。B. Rathsack， D. Medeiros和C.G. Wilson抵抗充电和加热。M. Bai， D. Chu和F. Pease掩膜加工s.a Rizvi掩膜材料：光学特性：叶涛，王长波，R. Heuser掩模测量，检验，评估，与修复掩膜特征测量J. Potzick光学临界尺寸测量R.J. Hoobler扫描电子显微镜中的掩膜临界尺寸测量M.T. Postek使用SPM的掩膜几何表征S. Muckenhirn和A. Meyyappan图像定位计量M.T. Takac掩膜应用的光学薄膜计量E. Apak PSM相位测量工具H. kususnose掩膜检测：理论与原理A. Rosenbusch and S. Hemar面具检测工具：Lasertec MD 2500 M. Yonezawa and T. Matsuyama面具图像评估工具A. Zibold面具修复R. Lee建模与仿真建模与仿真A. Erdmann INDEX
Foreword by Yoshio Nishi Preface, Syed Rizvi INTRODUCTION Introduction to Mask Making A.G. Zanzal MASK WRITING Data Preparation P.J.M. van Adrichem and C.K. Kalus Mask Writers: An Overview S. Babin E-Beam Mask Writers N. Saitou Laser Mask Writers C. Rydberg OPTICAL MASKS Optical masks: An Overview N. Yoshioka Conventional Optical Masks S.A. Rizvi Advanced Optical Masks W. Maurer and F. Schellenberg NGL MASKS NGL Masks: An Overview K.R. Kimmel and M. Lercel Masks for Electron Beam Projection Lithography H. Sano, S. Palmer, and M. Yamabe Masks for Extreme Ultraviolet Lithography P-Y. Yan Masks for Ion Projection Lithography S.A. Rizvi, F-M. Kamm, J. Butschke, F. Letzkus, and H. Loeschner Mask for Proximity X-Ray Lithography M. Oda and H. Yoshihara MASK PROCESSING, MATERIALS, AND PELLICLES Mask Substrate S.A. Rizvi Resists for Mask Making B. Rathsack, D. Medeiros, and C.G. Wilson Resist Charging and Heating M. Bai, D. Chu, and F. Pease Mask Processing S.A. Rizvi Mask Materials: Optical Properties V. Liberman Pellicles T. Yen, C.B. Wang, and R. Heuser MASK METROLOGY, INSPECTION, EVALUATION, AND REPAIRS Photomask Feature Metrology J. Potzick Optical Critical Dimension Metrology R.J. Hoobler Photomask Critical Dimension Metrology in the Scanning Electron Microscope M.T. Postek Geometrical Characterization of Mask Using SPM S. Muckenhirn and A. Meyyappan Metrology of Image Placement M.T. Takac Optical Thin Film Metrology for Photomask Applications E. Apak Phase Measurement Tool for PSM H. Kusunose Mask Inspection: Theories and Principle A. Rosenbusch and S. Hemar Tool for Inspecting Masks: Lasertec MD 2500 M. Yonezawa and T. Matsuyama Tool for Mask Image Evaluation A. Zibold Mask Repairs R. Lee MODELING AND SIMULATION Modeling and Simulation A. Erdmann INDEX