Stable thermoreflectance thermal imaging microscopy with piezoelectric position control
Stable thermoreflectance thermal imaging microscopy with piezoelectric position control
复制标题
带压电位置控制的稳定热反射热成像显微镜
DOI：
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发表时间：
2016
期刊：
影响因子：
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通讯作者：
A. Shakouri
中科院分区：
文献类型：
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作者：
A. Shakouri;A. Ziabari;D. Kendig;J. Bahk;Y. Xuan;P. Ye;K. Yazawa;A. Shakouri
热反射热成像显微镜是基于非常小的变化，在表面反射作为温度的函数。图像偏移和仪器漂移是获得准确和可再现热图像的限制因素。在大的放大倍率下，对于尺寸在数百纳米量级的设备，图像配准可能会显著妨碍准确的热反射测量。此外，图像模糊是一个问题，因为在测量过程中小的样品移动。图像配准和散焦的问题是特别重要的校准过程中提取的热反射系数的材料研究。校准需要使用外部载物台改变样品温度，这会由于载物台的热膨胀而导致显著的移动。在这项工作中，我们讨论了图像配准和散焦如何影响热反射热成像的准确测量和校准。我们还表明，通过结合和控制的位置下测试的样品与一个闭环压电阶段，可以进行准确和可重复的热测量。利用该装置，我们测量了金在几个波长和不同放大倍数下的热反射系数（CTR）。我们提出了第一次低于衍射极限的特征尺寸的热反射率校准，在200nm的顺序。
Thermoreflectance thermal imaging microscopy is based on very small change in the surface reflection as a function of temperature. Image shift and instrument drift are limiting factors to obtain accurate and reproducible thermal images. Under large magnification and for devices with sizes on the order of hundreds of nanometers, image registration could significantly encumber accurate thermoreflectance measurements. Additionally, image blurring is an issue because of small sample movements during the measurement. The problem of image registration and defocusing is particularly important during the calibration process to extract the thermoreflectance coefficient of the materials under study. Calibration requires changing the sample temperature with an external stage, which causes significant movement due to heat expansion from the stage. In this work, we discuss how the image registration and defocusing affect accurate measurement and calibration in thermoreflectance thermal imaging. We also show that by incorporating and controlling the position of the sample under test with a closed-loop piezo-stage one can perform accurate and reproducible thermal measurement. Using this setup, we measured the coefficient of thermoreflectance (CTR) of gold at several wavelengths and under different magnifications. We present for the first time thermoreflectance calibration of feature sizes below the diffraction limit, on the order of 200nm.