Position control in lithographic equipment
Position control in lithographic equipment
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发表时间：
2013
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通讯作者：
H. Butler;W. Simons
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作者：
H. Butler;W. Simons
在IC制造中，光刻扫描仪通过光学系统将电路图案曝光到半导体晶片上。保持晶片的载物台必须具有仅几纳米的扫描位置精度，以支持成像和重叠要求。在过去的10年里，工作台加速度、位置误差和建立时间都提高了5-8倍。与25年前的光刻步进机相比，受控台轴的数量从3个（模拟）增长到50个（高速数字）。
In IC manufacturing, lithographic scanners expose a circuit pattern onto a semiconductor wafer by means of an optical system. The stage holding the wafer must have a scanning position accuracy of only a few nanometers to support imaging and overlay requirements. In the past 10 years, stage acceleration, position error and settling time have all improved 5-8 times. Compared to lithographic steppers of 25 years ago, the number of controlled stage axes has grown from 3 (analog) to 50 (high-speed digital).