Insertion of an Oxygen Atom between Tellurium Atoms upon Oxidation of a Diaryl Telluride with NOBF4 or (CF3 SO2 )2 O/O2 : Dicationic Bis[diaryltellurium(IV)] Oxide.
Insertion of an Oxygen Atom between Tellurium Atoms upon Oxidation of a Diaryl Telluride with NOBF4 or (CF3 SO2 )2 O/O2 : Dicationic Bis[diaryltellurium(IV)] Oxide.
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DOI：
10.1002/(sici)1521-3773(19980420)37:7
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发表时间：
1998-04
影响因子：
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通讯作者：
Kenji Kobayashi;N. Deguchi;E. Horn;N. Furukawa
中科院分区：
文献类型：
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作者：
Kenji Kobayashi;N. Deguchi;E. Horn;N. Furukawa
NO和O2分子是双阳离子µ-氧代（二芳基碲）二聚体2（X= BF 4-，CF 3 SO 3-）的氧原子来源，其在用NOBF 4（方法A）或（CF 3 SO 2）2 O/O2化学氧化1时形成[方法B，Eq.（a）]。氧化剂NOBF 4的氮原子的命运在此阶段仍不确定。
NO and O2 molecules are the source of the oxygen atom for dicationic µ-oxo(diaryltellurium) dimers 2 (X=BF4- , CF3 SO3- ), which form upon chemical oxidation of 1 with NOBF4 (method A) or (CF3 SO2 )2 O/O2 [method B, Eq. (a)]. The fate of the nitrogen atom of the oxidizing agent NOBF4 remains uncertain at this stage.