Preparation of h-BN nano-film coated α-Si3N4 composite particles by a chemical route
Preparation of h-BN nano-film coated α-Si3N4 composite particles by a chemical route
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DOI：
10.1039/b210385k
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发表时间：
2003-01-01
影响因子：
--
通讯作者：
Gao, L
中科院分区：
文献类型：
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作者：
Li, JG;Gao, L
本研究采用一种新的化学方法在α-Si 3 N4颗粒表面成功包覆h-BN纳米薄膜。在无水乙醇溶液中，采用非均相沉淀法将硼酸氢铵沉积到氮化硅颗粒表面，制备了NH 4 HB 4 O 7. 3 H（2）O-Si 3 N4复合粉体。将所得复合粉末在室温下干燥，然后在900 ℃下在氨流中氮化，随后在1600 ℃下结晶，以获得h-BN纳米膜涂覆的α-Si 3 N 4复合颗粒。采用IR、SAM、TEM、HRTEM、TG和DSC等技术对所制备的复合粒子进行了表征。TEM和HRTEM结果表明，BN纳米粒子在α-Si 3 N4颗粒表面包覆了一层厚度约为1 nm的BN纳米薄膜。
In this study, alpha-Si3N4 particles were successfully coated with h-BN nano-film by a novel chemical route. Ammonium biborate was deposited onto the surface of silicon nitride particles to form NH4HB4O7.3H(2)O-Si3N4 composite powders by the heterogeneous precipitation method in anhydrous ethanol solution. The obtained composite powders were dried at room temperature, then nitrided in an ammonia flow at 900degreesC and subsequently crystallized at 1600degreesC to obtain h-BN nano-film coated alpha-Si3N4 composite particles. The prepared composite particles were characterized by IR, SAM, TEM, HRTEM, TG and DSC techniques. TEM and HRTEM micrographs showed that alpha-Si3N4 particles were well coated by BN ultrathin film in thickness of 1 nm.