Production of nanopatterns by a combination of electron beam lithography and a self-assembled monolayer for an antibody nanoarray
Production of nanopatterns by a combination of electron beam lithography and a self-assembled monolayer for an antibody nanoarray
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DOI：
10.1166/jnn.2007.146
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发表时间：
2007-02-01
影响因子：
--
通讯作者：
Ohdomari, Iwao
中科院分区：
文献类型：
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作者：
Zhang, Guo-Jun;Tanii, Takashi;Ohdomari, Iwao
我们报道了一种结合电子束光刻(EB)和全氟十二烷基三乙氧基硅烷(FDTES)自组装单分子膜(SAM)来制备抗体(IgG)纳米颗粒的灵活方法。利用FDTES SAM的电子束光刻技术，我们可以很容易地制作出特征尺寸在100 nm量级的Ig G图案。模式化的免疫球蛋白保留了其与抗-免疫球蛋白特异性相互作用的能力。考察了不同浓度的免疫球蛋白和抗-免疫球蛋白对制备的荧光免疫球蛋白的影响。原子力显微镜和表观荧光显微镜显示，在合适的孵育条件下，这些免疫球蛋白纳米粒子似乎得到了很好的控制，几乎没有检测到蛋白质与疏水性SAM的非特异性结合。该技术实现了高通量、高特异性的蛋白质纳米阵列。
We report on a flexible method of producing antibody (IgG) nanopatterns by combining electron beam (EB) lithography and a perfluorodecyltriethoxysilane (FDTES) self-assembled monolayer (SAM). Using EB lithography of the FDTES SAM, we easily fabricated IgG patterns with feature sizes on the order of 100 nm. The patterned IgG retained its ability to interact specifically with an anti-IgG. The influence of different concentrations of the IgG and anti-IgG on the resulting fluorescent IgG arrays was investigated. These IgG nanopatterns appeared to be remarkably well controlled and showed almost no detectable nonspecific binding of proteins on a hydrophobic SAM under a suitable incubation condition, characterized by atomic force microscopy, and epi-fluorescence microscopy. The technique enables the realization of high-throughput protein nanoscale arrays with high specificity.