Machine learning and contribution analysis of radicals to the properties of hydrogenated amorphous carbon films grown by a plasma-enhanced chemical vapor deposition
Machine learning and contribution analysis of radicals to the properties of hydrogenated amorphous carbon films grown by a plasma-enhanced chemical vapor deposition
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机器学习和自由基对等离子体增强化学气相沉积氢化非晶碳薄膜性能的贡献分析
DOI：
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发表时间：
2022
期刊：
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通讯作者：
and Masaru Hori
中科院分区：
文献类型：
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作者：
Hiroki Kondo;Jumpei Kurokawa;Kenji Ishikawa;Takayoshi Tsutsumi;Makoto Sekine;and Masaru Hori
