Conditions for Fabrication of Highly Conductive Wires by Electron-Beam-Induced Deposition
Conditions for Fabrication of Highly Conductive Wires by Electron-Beam-Induced Deposition
复制标题
电子束诱导沉积制造高导电线材的条件
DOI：
10.1143/jjap.38.7135
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发表时间：
1999
影响因子：
1.5
通讯作者：
M. Komuro
中科院分区：
文献类型：
--
作者：
H. Hiroshima;N. Suzuki;N. Ogawa;M. Komuro
使用 WF6 气体通过电子束诱导沉积 (EBID) 制造导线。除非在 EBID 之前清洁样品，否则很难制造具有良好再现性的高导电线。污染似乎会降低电线的电导率。在 EBID 之前对样品进行 O2 等离子清洗似乎可以减少污染的增长；然而，它对于 Au 图案附近的区域无效。我们发现，通过结合 300°C 退火和 O2 等离子清洗，可以在这些区域制造出具有相对良好再现性的高导电线。当 lindos 超过 70 µC/cm 时，导线电导和 lindose 之间存在线性关系。当气体通量减半时，根据电导估计沉积产率的变化约为 12%。由于气体供应不足，长度小于 40 nm 的导线的导电性比较长的导线差。
Conductive wires were fabricated by electron-beam-induced deposition (EBID) using WF6 gas. It was difficult to fabricate highly conductive wires with good reproducibility unless samples were cleaned before EBID. Contamination appears to reduce the conductivity of the wires. O2 plasma cleaning of samples before EBID seems to reduce contamination growth; however, it is not effective for regions in the vicinity of Au patterns. We found that by combining annealing at 300°C and O2 plasma cleaning, highly conductive wires could be fabricated with relatively good reproducibility in such regions. A linear relation was found between wire conductance and linedose at lindoses of more than 70 µC/cm. The change in deposition yield estimated from the conductance was about 12% when the gas flux was halved. Wires with a length of less than 40 nm were less conductive than longer wires because of a shortage in gas supply.