Oxidation of the Ru(0001) surface covered by weakly bound, ultrathin silicate films
Oxidation of the Ru(0001) surface covered by weakly bound, ultrathin silicate films
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DOI：
10.1016/j.susc.2015.06.019
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发表时间：
2016-04-01
期刊：
影响因子：
1.9
通讯作者：
Freund, Hans-Joachim
中科院分区：
文献类型：
--
作者：
Emmez, Emre;Boscoboinik, J. Anibal;Freund, Hans-Joachim
在金属基底上生长的双层硅酸盐膜与金属表面的结合较弱，这使得环境气体分子能够插入氧化物/金属界面。在本工作中，我们研究了在升高的O2压力（10（-5）-10 mbar）和温度（450-923 K）下，氧与Ru（0001）负载的硅铝酸盐和硅铝酸盐薄膜的相互作用。结果表明，在这些条件下，硅酸盐膜基本上保持完整，并且膜中的氧不与环境中的氧交换。O2分子容易穿透膜并在下面的Ru表面上解离。然而，硅酸盐层确实强烈地钝化Ru表面，使其朝向在相同条件下在裸Ru（0001）上容易发生的RuO 2（110）氧化物形成。结果表明，在界面处的有限空间中，金属表面上的氧化反应具有相当大的空间效应。此外，铝硅酸盐膜完全抑制Ru氧化，为在防腐蚀涂层中使用结晶铝硅酸盐提供了一些基本原理。(C)2015 Elsevier B. V.版权所有。
Bilayer silicate films grown on metal substrates are weakly bound to the metal surfaces, which allows ambient gas molecules to intercalate the oxide/metal interface. In this work, we studied the interaction of oxygen with Ru(0001) supported ultrathin silicate and aluminosilicate films at elevated 02 pressures (10(-5)-10 mbar) and temperatures (450-923 K). The results show that the silicate films stay essentially intact under these conditions, and oxygen in the film does not exchange with oxygen in the ambient. 02 molecules readily penetrate the film and dissociate on the underlying Ru surface underneath. The silicate layer does however strongly passivate the Ru surface towards RuO2(110) oxide formation that readily occurs on bare Ru(0001) under the same conditions. The results indicate considerable spatial effects for oxidation reactions on metal surfaces in the confined space at the interface. Moreover, the aluminosilicate films completely suppress the Ru oxidation, providing some rationale for using crystalline aluminosilicates in anti-corrosion coatings. (C) 2015 Elsevier B.V. All rights reserved.