GRAIN-BOUNDARY DEFECTS IN BLOCK-COPOLYMER SYSTEMS - BULK AND THIN-FILM RESULTS
GRAIN-BOUNDARY DEFECTS IN BLOCK-COPOLYMER SYSTEMS - BULK AND THIN-FILM RESULTS
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DOI：
10.1002/masy.199509801101
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发表时间：
1995-07-01
影响因子：
--
通讯作者：
THOMAS, EL
中科院分区：
文献类型：
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作者：
CARVALHO, BL;LESCANEC, RL;THOMAS, EL
有序的周期性形态是嵌段共聚物体系中微相分离状态的大多数讨论的标志，然而实际材料包含无数的缺陷。也许这些缺陷中最重要的是那些构成有序晶粒之间区域的缺陷。用透射电子显微镜（TEM）研究了两嵌段共聚物在本体和薄膜中的晶界形态。这些实验表明，恒定平均曲率（CMC）的表面往往是有用的描述符，不仅为微相分离的共聚物的平衡形态，而且为微相分离的形态内的晶界。
Ordered periodic morphologies are the hallmark of most discussions of the microphase-separated state in block copolymer systems yet actual materials contain a myriad of defects. Perhaps the most important of these defects are those which constitute the regions between ordered grains. Transmission electron microscopy (TEM) is used to investigate the grain boundary morphology of diblock copolymers in both bulk and thin film geometries. These experiments show that constant mean curvature (CMC) surfaces are often useful descriptors, not only for the equilibrium morphology of microphase-separated copolymers, but also for the microphase-separated morphology within grain boundaries.