Completely Bi-Substituted Iron Garnet (BIG) Films Prepared by Electron Cyclotron Resonance (ECR) Sputtering
Completely Bi-Substituted Iron Garnet (BIG) Films Prepared by Electron Cyclotron Resonance (ECR) Sputtering
复制标题
电子回旋共振 (ECR) 溅射制备完全双取代铁石榴石 (BIG) 薄膜
DOI：
10.1143/jjap.31.1786
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发表时间：
1992
影响因子：
1.5
通讯作者：
Ken'ichi Ono Ken'ichi Ono
中科院分区：
文献类型：
--
作者：
S. Mino;M. Matsuoka;A. Tate;Atsushi Shibukawa Atsushi Shibukawa;Ken'ichi Ono Ken'ichi Ono
采用电子回旋共振（ECR）溅射技术在石榴石衬底上外延合成了完全双取代铁石榴石（BIG）薄膜。BIG薄膜外延生长的临界温度、结晶度和法拉第旋转θF与O2气体流速有关。在390℃以上的温度下，以7 sccm的最佳流速获得单晶BIG膜，θF达到最大值8.4×104℃/cm （λ=0.633µm）。最小铁磁共振（FMR）线宽ΔH为70 Oe；这是有史以来报告的最小值。单轴垂直磁各向异性主要由薄膜与衬底热膨胀失配引起的弹性变形引起。
Completely Bi-substituted iron garnet (BIG) films were epitaxially synthesized on garnet substrates by electron cyclotron resonance (ECR) sputtering. The critical temperature for the epitaxial growth, crystallinities, and Faraday rotation θF of BIG films depend on the O2 gas flow rate. With an optimum flow rate of 7 sccm, single-crystal BIG films were obtained at temperatures above 390°C, and θF achieved its largest value of 8.4×104 deg/cm (λ=0.633 µm). The minimum ferromagnetic resonance (FMR) linewidth ΔH was 70 Oe; this is the smallest value ever reported. The uniaxial perpendicular magnetic anisotropy is mainly caused by the elastic deformation induced by the thermal expansion mismatch between the film and the substrate.