Fabrication and testing of solid polymer dye microcavity lasers based on PMMA micromolding
Fabrication and testing of solid polymer dye microcavity lasers based on PMMA micromolding
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基于PMMA微成型的固体聚合物染料微腔激光器的制造和测试
DOI：
10.1088/0960-1317/11/3/312
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发表时间：
2001
影响因子：
2.3
通讯作者：
K. Hane
中科院分区：
文献类型：
--
作者：
Yigui Li;M. Sasaki;K. Hane
本文介绍了一种制备硅晶体平面的新工艺。通过深度反应离子刻蚀（RIE）预先获得了所选的硅晶面，这些面并不总是具有最低刻蚀率的平面。采用二胺邻苯二酚和水对硅各向异性湿法刻蚀，得到了硅的平面晶面。我们通过制造一个固体聚合物染料微腔激光器来证明所提出的技术，该激光器是用蚀刻硅腔模塑的。研究了获得硅模腔非常光滑侧壁的蚀刻条件。激光光谱证实了用干涉仪和原子力显微镜测量的蚀刻表面的平整度。
In this paper, a new fabrication technique to obtain silicon crystalline flat planes is described. The selected Si crystalline planes, that are not always the planes having the lowest etching rate, are pre-obtained by deep reactive ion etching (RIE). The flat crystalline planes are generated by Si anisotropic wet etching with ethylenediamine pyrocatechol and water after the deep-RIE. We demonstrate the proposed technique by fabricating a solid polymer dye microcavity laser, which is molded with the etched Si cavity. The etched condition for obtaining the very smooth sidewall of the cavity of the Si mold has been investigated. The lasing spectra confirm the flatness of the etched surface that is measured by an interferometer and an atomic force microscope.