Comparative study on structure and internal stress in tin-doped indium oxide and indium-zinc oxide films deposited by r.f. magnetron sputtering
Comparative study on structure and internal stress in tin-doped indium oxide and indium-zinc oxide films deposited by r.f. magnetron sputtering
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DOI：
10.1016/j.tsf.2003.08.047
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发表时间：
2003-12
期刊：
影响因子：
2.1
通讯作者：
T. Sasabayashi;N. Ito;E. Nishimura;M. Kon;P. Song;K. Utsumi;A. Kaijo;Y. Shigesato
中科院分区：
文献类型：
--
作者：
T. Sasabayashi;N. Ito;E. Nishimura;M. Kon;P. Song;K. Utsumi;A. Kaijo;Y. Shigesato
