Research on Material Removal Characteristics of Nanoparticle Colloid Jet Machining
Research on Material Removal Characteristics of Nanoparticle Colloid Jet Machining
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纳米粒子胶体射流加工材料去除特性研究
DOI：
10.4028/www.scientific.net/amr.69-70.187
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发表时间：
2009-05
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为了获得超光滑表面，设计并制造了一种纳米颗粒胶体射流加工系统，利用可逆的分解反应去除表面原子。分析了纳米颗粒胶体射流加工的材料去除特性。通过一系列的去除实验，研究了纳米颗粒胶体射流加工材料的去除特性。采用纳米粒子胶体射流加工系统对K9玻璃样品进行抛光，获得了微观粗糙度RMS小于1 nm的超光滑表面。实验结果表明，采用纳米粒子胶体射流加工技术可以获得超光滑表面。
For producing ultra smooth surface, a nanoparticle colloid jet machining system has been designed and manufactured in which a reversible polymerize and decompose reaction is utilized to remove surface atoms. The material removal characteristics of nanoparticle colloid jet machining were analyzed. A series of removal experiments were conducted to show the characteristics of the material removal in nanoparticle colloid jet machining. A K9 glass sample had been polished by using the nanoparticle colloid jet machining system, and an ultra smooth surface with micro roughness less than 1 nm RMS had been obtained. The experimental results prove that it is suitable to fabricate ultra smooth surface with nanoparticle colloid jet machining.