Thermal decomposition of alkylsiloxane self-assembled monolayers in air
Thermal decomposition of alkylsiloxane self-assembled monolayers in air
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DOI：
10.1021/jp022377s
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发表时间：
2003-05-08
影响因子：
3.3
通讯作者：
Sung, MM
中科院分区：
文献类型：
--
作者：
Kim, HK;Lee, JP;Sung, MM
用原子力显微镜、X射线光电子能谱和接触角分析研究了烷基硅氧烷自组装膜在空气中的热分解。发现该单分子膜在空气中直至约200 ℃是稳定的。在220 ℃以上，单分子膜主要通过C-C键断裂分解，链长逐渐减少。硅氧烷头基在单分子膜中的烃片段分解后保留在表面上。
The thermal decomposition of alkylsiloxane self-assembled monolayers in air has been studied using atomic force microscopy, X-ray photoelectron spectroscopy, and contact angle analysis. It is found that the monolayers are stable in air up to about 200 degreesC. Above 220 degreesC the monolayers primarily decompose through C-C bond cleavage, with a gradual reduction in chain length. The siloxane headgroups remain on the surface following the decomposition of hydrocarbon fragments in the monolayers.