Modeling of Cathodoluminescence and Photoluminescence Properties of Pulsed Laser-Deposited Europium-Activated Yttrium Oxide Thin Film Phosphors
Modeling of Cathodoluminescence and Photoluminescence Properties of Pulsed Laser-Deposited Europium-Activated Yttrium Oxide Thin Film Phosphors
复制标题
脉冲激光沉积铕激活氧化钇薄膜荧光粉的阴极发光和光致发光特性的建模
DOI：
10.1557/proc-558-21
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发表时间：
1999
期刊：
影响因子：
--
通讯作者：
R. Singh
中科院分区：
文献类型：
--
作者：
K. G. Cho;D. Kumar;Zhan Chen;P. Holloway;R. Singh
利用248nm KrF脉冲激光在（100）硅和（0001）蓝宝石衬底上沉积了铕活化氧化钇（Eu: y2o3）薄膜。为了研究Eu: y2o3薄膜粗糙度对阴极发光（CL）和光致发光（PL）性能的影响，使用了不同粗糙度的衬底表面。发现粗糙度对Eu: y2o3薄膜的CL和PL亮度有重要影响。通过增加薄膜粗糙度而提高的亮度是由于从荧光粉薄膜表面逸出的光的总部分增加。已经提出了一个强有力地支持这一解释的模型。结果表明，较慢生长速率和较低激光能量的沉积是提高Eu: y2o3薄膜荧光粉CL亮度更重要的参数。
Europium-activated yttrium oxide (Eu:Y 2 O 3 ) thin films were deposited on (100) silicon and (0001) sapphire substrates using 248 nm KrF pulsed laser. To investigate the effect of the Eu:Y 2 O 3 film roughness on cathodoluminescence (CL) and photoluminescence (PL) properties, the substrate surfaces with various roughnesses were used. The roughness was found to play an important role in determining CL and PL brightness of the Eu:Y 2 O 3 films. The improvement in brightness by increasing the film roughness is due to increase in total portion of light that escapes from the surface of the phosphor film. A model has been proposed which supports strongly this explanation. Our results show that depositions with slower growth rate and lower laser energy are more important parameters than increasing the roughness to improve CL brightness of the Eu:Y 2 O 3 thin film phosphors.