ATRX Plays a Key Role in Maintaining Silencing at Interstitial Heterochromatic Loci and Imprinted Genes.
ATRX Plays a Key Role in Maintaining Silencing at Interstitial Heterochromatic Loci and Imprinted Genes.
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DOI:
10.1016/j.celrep.2015.03.036
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发表时间:
2015-04-21
期刊:
影响因子:
8.8
通讯作者:
Gibbons RJ
中科院分区:
文献类型:
--
作者:
Voon HP;Hughes JR;Rode C;De La Rosa-Velázquez IA;Jenuwein T;Feil R;Higgs DR;Gibbons RJ
Histone H3.3 is a replication-independent histone variant, which replaces histones that are turned over throughout the entire cell cycle. H3.3 deposition at euchromatin is dependent on HIRA, whereas ATRX/Daxx deposits H3.3 at pericentric heterochromatin and telomeres. The role of H3.3 at heterochromatic regions is unknown, but mutations in the ATRX/Daxx/H3.3 pathway are linked to aberrant telomere lengthening in certain cancers. In this study, we show that ATRX-dependent deposition of H3.3 is not limited to pericentric heterochromatin and telomeres but also occurs at heterochromatic sites throughout the genome. Notably, ATRX/H3.3 specifically localizes to silenced imprinted alleles in mouse ESCs. ATRX KO cells failed to deposit H3.3 at these sites, leading to loss of the H3K9me3 heterochromatin modification, loss of repression, and aberrant allelic expression. We propose a model whereby ATRX-dependent deposition of H3.3 into heterochromatin is normally required to maintain the memory of silencing at imprinted loci. ATRX deposits H3.3 at heterochromatin throughout the genome ATRX and H3.3 preferentially bind the methylated allele of imprinted DMRs H3.3 deposition at imprinted DMRs is dependent on ATRX Loss of ATRX/H3.3 leads to loss of H3K9me3 modification at imprinted DMRs Voon et al. demonstrate that ATRX deposits the histone variant H3.3 at the methylated allele of imprinted differentially methylated regions. ATRX knockout leads to the loss of H3.3 and the H3K9me3 heterochromatin modification at these regions, suggesting a unique role for H3.3 in maintaining heterochromatin silencing.
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影响因子:
10.5
作者:
Drane, Pascal;Ouararhni, Khalid;Hamiche, Ali
通讯作者:
Hamiche, Ali
影响因子:
64.5
作者:
Banaszynski LA;Wen D;Dewell S;Whitcomb SJ;Lin M;Diaz N;Elsässer SJ;Chapgier A;Goldberg AD;Canaani E;Rafii S;Zheng D;Allis CD
通讯作者:
Allis CD
影响因子:
16.8
作者:
Iwase, Shigeki;Xiang, Bin;Ghosh, Sharmistha;Ren, Ting;Lewis, Peter W.;Cochrane, Jesse C.;Allis, C. David;Picketts, David J.;Patel, Dinshaw J.;Li, Haitao;Shi, Yang
通讯作者:
Shi, Yang
影响因子:
--
作者:
Langmead, Ben
通讯作者:
Langmead, Ben
影响因子:
64.5
作者:
Goldberg AD;Banaszynski LA;Noh KM;Lewis PW;Elsaesser SJ;Stadler S;Dewell S;Law M;Guo X;Li X;Wen D;Chapgier A;DeKelver RC;Miller JC;Lee YL;Boydston EA;Holmes MC;Gregory PD;Greally JM;Rafii S;Yang C;Scambler PJ;Garrick D;Gibbons RJ;Higgs DR;Cristea IM;Urnov FD;Zheng D;Allis CD
通讯作者:
Allis CD