Abatement and toxicity reduction of antimicrobials by UV/H2O2 process.
Abatement and toxicity reduction of antimicrobials by UV/H2O2 process.
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DOI：
10.1016/j.jenvman.2017.02.028
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发表时间：
2017-05
影响因子：
8.7
通讯作者：
Vanessa Ribeiro Urbano;Marcela Souza Peres;M. Maniero;J. R. Guimarães
中科院分区：
文献类型：
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作者：
Vanessa Ribeiro Urbano;Marcela Souza Peres;M. Maniero;J. R. Guimarães
在环境水中不断检测到抗菌剂，去除它们对于避免健康和微生物损害非常重要。在这项工作中，研究了紫外线辐射 (UV/H2O2) 辅助的过氧化反应，以验证该过程是否能够降解磺胺喹喔啉和氧氟沙星抗菌剂，并消除溶液的毒性和抗菌活性。该过程对抗菌剂的降解有效，尽管抗菌活性被消除，但溶液的毒性在整个反应时间内增加。
Antimicrobials are continuously detected in environmental waters and their removal is important to avoid health and microorganisms damage. In this work, the peroxidation assisted by ultraviolet radiation (UV/H2O2) was studied to verify if the process was able to degrade sulfaquinoxaline and ofloxacin antimicrobials and to remove the toxicity and the antimicrobial activity of the solution. This process was effective on degradation of the antimicrobials, despite the antimicrobial activity removal, the toxicity of the solution increased throughout the reaction time.