Deposition of cubic boron nitride films by anode layer linear ion source assisted radio frequency magnetron sputtering
Deposition of cubic boron nitride films by anode layer linear ion source assisted radio frequency magnetron sputtering
复制标题
阳极层线性离子源辅助射频磁控溅射沉积立方氮化硼薄膜
DOI：
10.1016/j.tsf.2018.03.005
复制
发表时间：
2018-05-01
期刊：
影响因子：
2.1
通讯作者：
Zuo, Dunwen
中科院分区：
文献类型：
--
作者：
Tian, Shuai;Xu, Feng;Zuo, Dunwen
阳极层线性离子源（ALLIS）可以提高工作气体的电离率，增强气体分子的活性。本文采用射频磁控溅射（RFMS）方法制备了存款立方氮化硼（cBN）薄膜，并研究了射频磁控溅射对cBN薄膜微观结构和力学性能的影响。采用傅立叶变换红外光谱、X射线光电子能谱、扫描电子显微镜和纳米压痕等方法对cBN薄膜的物相组成、化学成分、成键状态、表面形貌、沉积速率和纳米硬度进行了表征。结果表明，随着ALLIS功率的增加，cBN薄膜中sp（3）相含量先增加后减少，当ALLIS功率为200 W时，sp（3）相含量达到最大值83%，cBN薄膜的表面质量和生长速率明显提高。硬度和弹性模量随立方相含量的变化趋势相同。最后，系统地讨论了ALLIS对cBN合成的影响。
Anode Layer Linear Ion Source (ALLIS) can improve the ionization rate of working gases and enhance the activity of gas molecules. In the present work, the ALLIS assisted Radio Frequency Magnetron Sputtering (RFMS) method was proposed to deposit cubic boron nitride (cBN) films, and the effect of ALLIS on the microstructure and mechanical properties of the deposited cBN films was investigated. The phase component, chemical composition, bonding states, surface topography, deposition rate and nanohardness of the cBN films were characterized respectively by Fourier transformed infrared spectroscopy, X-ray photoelectron spectroscopy, scanning electron microscopy and nanoindentation. The results indicated that the sp(3) phase content in cBN films increased at first and then decreased with the increase of ALLIS power, and the maximum value was 83% when the ALLIS power was 200 W, the surface quality and growth rate of cBN films were enhanced markedly. The hardness and elastic modulus exhibited the same trend to variation of cubic phase content. Finally, the effect of ALLIS on the cBN synthesis was discussed systematically.