Mapping the depleted area of silicon diodes using a micro-focused X-ray beam
Mapping the depleted area of silicon diodes using a micro-focused X-ray beam
复制标题
使用微聚焦 X 射线束绘制硅二极管的耗尽区域图
DOI:
10.1088/1748-0221/14/03/p03024
复制
发表时间:
2018
影响因子:
1.3
通讯作者:
Y. Unno
中科院分区:
文献类型:
--
作者:
L. Poley;A. Blue;I. Bloch;C. Buttar;V. Fadeyev;J. Fernandez;C. Fleta;J. Hacker;C. Llácer;M. Miñano;M. Renzmann;E. Rossi;C. Sawyer;D. Sperlich;M. Stegler;M. Ullán;Y. Unno
For the Phase-II Upgrade of the ATLAS detector at CERN, the current ATLAS Inner Detector will be replaced with the ATLAS Inner Tracker (ITk). The ITk will be an all-silicon detector, consisting of a pixel tracker and a strip tracker. Sensors for the ITk strip tracker are required to have a low leakage current up to bias voltages of −500 V to maintain a low noise and power dissipation. In order to minimise sensor leakage currents, particularly in the high-radiation environment inside the ATLAS detector, sensors are foreseen to be operated at low temperatures and to be manufactured from wafers with a high bulk resistivity of several kΩ·cm. Simulations showed the electric field inside sensors with high bulk resistivity to extend towards the sensor edge, which could lead to increased surface currents for narrow dicing edges. In order to map the electric field inside biased silicon sensors with high bulk resistivity, three diodes from ATLAS silicon strip sensor prototype wafers were studied with a monochromatic, micro-focused X-ray beam at the Diamond Light Source (Didcot, U.K.). For all devices under investigation, the electric field inside the diode was mapped and its dependence on the applied bias voltage was studied.
DOI:
10.1016/j.nima.2016.03.042
发表时间:
2016
期刊:
Accelerators, Spectrometers, Detectors and Associated Equipment
影响因子:
--
作者:
Hommels L
通讯作者:
Hommels L