Microchannel Wetting for Controllable Patterning and Alignment of Silver Nanowire with High Resolution.
Microchannel Wetting for Controllable Patterning and Alignment of Silver Nanowire with High Resolution.
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DOI:
10.1021/acsami.5b06370
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发表时间:
2015-09
影响因子:
9.5
通讯作者:
Bo‐Ru Yang;W. Cao;Gui-Shi Liu;Hui-Jiuan Chen;Yong‐Young Noh;T. Minari;Hsiang-Chi Hsiao;Chia-Yu Lee;H. Shieh;Chuan Liu
中科院分区:
文献类型:
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作者:
Bo‐Ru Yang;W. Cao;Gui-Shi Liu;Hui-Jiuan Chen;Yong‐Young Noh;T. Minari;Hsiang-Chi Hsiao;Chia-Yu Lee;H. Shieh;Chuan Liu
Patterning and alignment of conductive nanowires are essential for good electrical isolation and high conductivity in various applications. Herein a facile bottom-up, additive technique is developed to pattern and align silver nanowires (AgNWs) by manipulating wetting of dispersions in microchannels. By forming hydrophobic/hydrophilic micropatterns down to 8 μm with fluoropolymer (Cytop) and SiO2, the aqueous AgNW dispersions with the optimized surface tension and viscosity self-assemble into microdroplets and then dry to form anisotropic AgNW networks. The alignment degree characterized by the full width at half-maximum (FWHM) can be well-controlled from 39.8° to 84.1° by changing the width of microchannels. A mechanism is proposed and validated by statistical analysis on AgNW alignment, and a static model is proposed to guide the patterning of general NWs. The alignment reduced well the electrical resistivity of AgNW networks by a factor of 5 because of the formation of efficient percolation path for carrier conduction.