Enhanced multiferroic properties and domain structure of La-doped BiFeO3 thin films
Enhanced multiferroic properties and domain structure of La-doped BiFeO3 thin films
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DOI：
10.1016/j.scriptamat.2010.06.013
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发表时间：
2010-10
影响因子：
6
通讯作者：
F. Yan;T. Zhu;M. Lai;Ling Lu
中科院分区：
文献类型：
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作者：
F. Yan;T. Zhu;M. Lai;Ling Lu
采用脉冲激光沉积法在Pt/TiO 2/SiO2/Si衬底上制备了BiFeO 3（BFO）和La掺杂的BFO（BLFO）薄膜。通过压电响应力显微镜研究了BFO和BLFO的畴结构。通过La掺杂，获得了具有102μCcm− 2的大反射极化（Pr）和降低的漏电流密度的高度增强的铁电性能。的磁性也增加了La掺杂，归因于空间均匀化的自旋排列。讨论了铁电和铁磁特性增强的机理。
BiFeO3(BFO) and La-doped BFO (BLFO) thin films were grown on Pt/TiO2/SiO2/Si substrate using pulsed laser deposition. The domain structures of the BFO and BLFO were investigated via piezoresponse force microscopy. Highly enhanced ferroelectric properties with great remanent polarization (Pr) of 102μCcm−2and decreased leakage current density were obtained via La doping. The magnetic property was also increased by the La doping, ascribed to spatial homogenization of the spin arrangement. The mechanisms for the enhancement of ferroelectric and ferromagnetic characteristics are discussed.