Optical and structural characteristics of ZnO thin films grown by rf magnetron sputtering
Optical and structural characteristics of ZnO thin films grown by rf magnetron sputtering
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DOI：
10.1016/j.materresbull.2007.05.006
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发表时间：
2008-02-05
影响因子：
5.4
通讯作者：
Ray, S. K.
中科院分区：
文献类型：
--
作者：
Mandal, S.;Singha, R. K.;Ray, S. K.
温度通过X射线衍射和原子力显微镜分析，研究了结构特征和表面形貌。发现膜在高于400 nm的可见光范围内是透明的，具有高于90%的透明度。尖锐的紫外吸收边约370 nm被用来提取不同粒径的样品的光学带隙。薄膜的光学带隙能量为3.24 ~ 3.32 eV，电子跃迁为直接跃迁。讨论了纳米ZnO薄膜的禁带宽度与晶粒尺寸和应变的关系。在所有样品中观察到UV范围内的光致发光发射，这是由于近带边发射比绿色带发射（由于缺陷态）更强，表明沉积膜的良好光学质量。(c)2007爱思唯尔有限公司版权所有。
temperatures. Structural features and surface morphology were studied by X-ray diffraction and atomic force microscopy analyses. Films were found to be transparent in the visible range above 400 nm, having transparency above 90%. Sharp ultraviolet absorption edges around 370 nm were used to extract the optical band gap for samples of different particle sizes. Optical band gap energy for the films varied from 3.24 to 3.32 eV and the electronic transition was of the direct in nature. A correlation of the band gap of nanocrystalline ZnO films with particle size and strain was discussed. Photoluminescence emission in UV range, which is due to near band edge emission is more intense in comparison with the green band emission (due to defect state) was observed in all samples, indicating a good optical quality of the deposited films. (c) 2007 Elsevier Ltd. All rights reserved.