Theoretical Relationship between Quencher Diffusion Constant and Image Quality in Chemically Amplified Resists Used for Extreme Ultraviolet Lithography
Theoretical Relationship between Quencher Diffusion Constant and Image Quality in Chemically Amplified Resists Used for Extreme Ultraviolet Lithography
复制标题
用于极紫外光刻的化学放大抗蚀剂中猝灭剂扩散常数与图像质量之间的理论关系
DOI：
10.7567/jjap.52.076504
复制
发表时间：
2013
期刊：
影响因子：
--
通讯作者：
T. Kozawa
中科院分区：
文献类型：
--
作者：
M. Yamazaki;J. Adachi;T. Teramoto;A. Yagishita;T. Kozawa
