Microstructure and magnetic properties of Fe100-xPtx alloy films
Microstructure and magnetic properties of Fe100-xPtx alloy films
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DOI：
10.1063/1.369536
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发表时间：
1999-02-15
影响因子：
3.2
通讯作者：
Wu, HC
中科院分区：
文献类型：
--
作者：
Kuo, CM;Kuo, PC;Wu, HC
铂组分x=25-67at的Fe100-xPtx多晶合金薄膜。用直流磁控溅射法在自然氧化的硅片衬底上制备了%，然后在不同温度和不同时间的真空中进行了后处理。研究了薄膜成分、磁层厚度、退火温度和退火时间对平行和垂直于薄膜平面的磁性能的影响。在400~650℃的温度范围内进行热处理，可以得到具有较高的面内矫直力的薄膜，当薄膜成分为Fe50Pt50，厚度约为200 nm时，在600℃下热处理30min，薄膜的面内正方形和矫直力达到最佳。透射电子显微镜衍射图分析表明，退火后的Fe50Pt50薄膜几乎完全为FCT-GAMA(1)-FePT相。制备的Fe50Pt50薄膜的平均粒径约为85 nm。退火后薄膜的晶粒尺寸几乎与冷却速度无关，但薄膜的磁硬化机制和矫直力在很大程度上依赖于冷却速度。(C)1999年美国物理研究所。[S0021-8979(99)01404-8]。
Polycrystalline Fe100-xPtx alloy thin films with Pt composition x = 25-67 at. % were prepared by dc magnetron sputtering on natural-oxidized silicon wafer substrates, then postannealed in vacuum at various temperatures and over different periods. The effects of film composition, magnetic layer thickness, annealing temperature, and annealing time on the magnetic properties parallel and normal to the film plane were investigated. Films with high in-plane coercivity could be obtained by annealing the films in the temperature range between 400 and 650 degrees C. Optimum in-plane squareness and coercivity of the film occurred at a film composition of Fe50Pt50 with thickness of about 200 nm after annealing at 600 degrees C for 30 min. The analyses of transmission electron microscopy diffraction patterns indicated that this annealed Fe50Pt50 film was nearly entirely in the fct gamma(1)-FePt phase. The average grain size of this Fe50Pt50 film was about 85 nm. The grain size was almost independent of the cooling rate after annealing, but the magnetic hardening mechanism and coercivity of the annealed film was largely dependent on the cooling rate. (C) 1999 American Institute of Physics. [S0021-8979(99)01404-8].