Residual layer thickness in nanoimprint: Experiments and coarse-grain simulation
Residual layer thickness in nanoimprint: Experiments and coarse-grain simulation
复制标题
DOI:
10.1016/j.mee.2007.12.041
复制
发表时间:
2008-05-01
影响因子:
2.3
通讯作者:
Zaitsev, Sergey
中科院分区:
文献类型:
--
作者:
Kehagias, Nikolaos;Reboud, Vincent;Zaitsev, Sergey
A refined coarse-grain method for simultaneous calculation of the resist viscous flow in nanoimprint lithography and the stamp/substrate deformation is presented. The method has been realized in an effective simulation tool for the verification of stamp structures on standard personal computers, by using the GDS data of the stamp design. From the presented comparison of calculated and experimental results, it can be concluded that the coarse-grain modeling allows predicting the residual layer thickness with accuracy better than 10%. (c) 2007 Elsevier B.V. All rights reserved.