One-step hydrothermal deposition of F:FeOOH onto BiVO4 photoanode for enhanced water oxidation

One-step hydrothermal deposition of F:FeOOH onto BiVO4 photoanode for enhanced water oxidation
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F:FeOOH 一步水热沉积到 BiVO4 光阳极上以增强水氧化

DOI:
10.1016/j.cej.2019.123703
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发表时间:
2020-07
影响因子:
15.1
通讯作者:
Wang Qizhao
Wang Qizhao
中科院分区:
工程技术1区
文献类型:
--
作者:
She Houde;Yue Pengfei;Huang Jingwei;Wang Lei;Wang Qizhao

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虽然BiVO 4被认为是光电化学(PEC)水氧化的最有前途的候选人之一,但其进一步应用受到严重的表面电荷复合的阻碍。本文采用一步水热沉积法制备了掺F的FeOOH(F:FeOOH)助催化剂对BiVO 4光阳极进行改性。复合光阳极(F:FeOOH/BiVO 4)显示出令人印象深刻的2.7 mA/cm 2的光电流密度(在1.23 VRHE)和相对于纯BiVO 4电极负移150 mV的显著的初始电位。这些优异的光电转换性能主要归功于F:FeOOH和BiVO 4之间形成的p-n结。
While BiVO4is considered one of the most promising candidates for photoelectrochemical (PEC) water oxidation, its further application is hampered by severe surface charge recombination. Herein, F-incorporated FeOOH (F:FeOOH) cocatalyst is used to modify the BiVO4photoanode via a one-step hydrothermal deposition method. The composite photoanode (F:FeOOH/BiVO4) shows an impressive photocurrent density of 2.7 mA/cm2(at 1.23 VRHE) and a notable initial potential that is negatively shifted by 150 mV relative to the pure BiVO4electrode. These excellent PEC performances owe much to the formation of p-n junction between F:FeOOH and BiVO4in the electrodes.
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