Analyses of edge effects on residual stresses in film strip/substrate systems
Analyses of edge effects on residual stresses in film strip/substrate systems
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DOI：
10.1063/1.1288161
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发表时间：
2000-08
影响因子：
3.2
通讯作者：
C. Hsueh
中科院分区：
文献类型：
--
作者：
C. Hsueh
薄膜带的边缘对覆盖在基片上的薄膜带中的残余应力分布有影响。一个分析模型，推导出一个封闭形式的解决方案，应力分布沿着膜宽。由于薄膜比衬底薄得多，因此忽略了薄膜厚度的应力变化;然而，在分析中考虑了衬底厚度的应力变化。与现有的分析模型相比，该模型更加严格，分析结果与有限元结果和实验测量结果吻合更好。
The residual stress distribution in a thin-film strip overlaid on a substrate is influenced by the edges of the strip. An analytical model is developed to derive a closed-form solution for the stress distribution along the film width. Because the film is much thinner than the substrate, the stress variation through the film thickness is ignored; however, the stress variation through the substrate thickness is considered in the analysis. Compared to the existing analytical models, the present model is more rigorous and the analytical results agree better with both finite element results and experimental measurements.