A comparative study of Si-C-N films on different substrates grown by RF magnetron sputtering
A comparative study of Si-C-N films on different substrates grown by RF magnetron sputtering
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DOI：
10.1016/j.jallcom.2008.11.105
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发表时间：
2009-06-10
影响因子：
6.2
通讯作者：
Das, G. C.
中科院分区：
文献类型：
--
作者：
Bhattacharyya, A. S.;Mishra, S. K.;Das, G. C.
采用射频磁控溅射法在硅（10 0）、硼硅酸盐玻璃和不锈钢（304 SS）等重要工业基底上制备了Si-C-N纳米复合薄膜。通过透射电子显微镜（TEM）进行了微观结构表征，显示在非晶Si-C-N基质中局部存在β-C3 N4，这通过X射线光电子能谱（XPS）和拉曼光谱得到证实。基板和涂层之间发生的热失配导致三种不同基板的沉积速率、粗糙度和其他机械性能如硬度和粘附力的变化。进行微压痕和纳米压痕来估计涂层的硬度。划痕试验用于粘附性研究。(C)2008 Elsevier B. V.保留所有权利。
Si-C-N nanocomposite thin films were deposited on industrially important substrates like silicon (10 0), borosilicate glass, and stainless steel (304SS) by radio frequency (RF) magnetron sputtering. The microstructural characterization was carried out by transmission electron microscopy (TEM) showing localized beta-C3N4 in amorphous Si-C-N matrix, which was confirmed by X-ray photoelectron spectroscopy (XPS) and Raman spectroscopy. The thermal mismatch occurring between the substrate and the coating resulted in variation in deposition rate, roughness and other mechanical properties like hardness and adhesion for the three different substrates. Both microindentation and nanoindentation were performed to estimate the hardness of the coatings. Scratch tests were used for the adhesion studies. (C) 2008 Elsevier B.V. All rights reserved.