Impact of Relative Humidity during Spin-Deposition of Metal Oxide Thin Films from Aqueous Solution Precursors
Impact of Relative Humidity during Spin-Deposition of Metal Oxide Thin Films from Aqueous Solution Precursors
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DOI：
10.1021/acs.chemmater.6b05200
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发表时间：
2017-04-11
影响因子：
8.6
通讯作者：
Page, Catherine J.
中科院分区：
文献类型：
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作者：
Plassmeyer, Paul N.;Mitchson, Gavin;Page, Catherine J.
薄膜溶液前驱体旋转加工过程中的相对湿度往往无法控制或测量，其对薄膜厚度的影响通常不被重视。本文报道了自旋加工过程中的相对湿度对非晶态金属氧化物（氧化铝和氧化锆镧）和氧化硫酸铪（HafSOx）薄膜的膜厚有显著影响。在研究的湿度范围[20-95%相对湿度（RH）]中，薄膜厚度变化了近3倍，而且这种影响与金属前驱体身份无关。我们的数据表明，薄膜厚度与所有研究系统的蒸发速率（100 - RH）呈线性关系，表明这种影响主要是由于水作为溶剂的独特特性。对不同湿度下沉积的HafSOx薄膜的x射线原位反射率研究表明，虽然厚度随湿度变化显著，但沉积膜的密度相似，表明湿度主要影响沉积材料的相对量。由于可复制的薄膜厚度对许多应用至关重要，我们的数据强调了在旋转加工过程中控制湿度的重要性。
Relative humidity during the spin-processing of thin film solution precursors is often not controlled or measured, and its effect on film thickness is generally unappreciated. Herein, we report that the relative humidity during spin-processing has a marked impact on the film thickness of amorphous metal oxide (aluminum oxide and lanthanum zirconium oxide) and hafnium oxide-sulfate (HafSOx) thin films deposited from aqueous precursors. In the humidity range studied [20-95% relative humidity (RH)], film thicknesses varied by a factor of nearly 3, and this effect is independent of the metal precursor identity. Our data suggest that film thickness depends linearly on evaporation rate (100 - RH) for all systems studied, suggesting this effect is predominantly due to the unique characteristics of water as a solvent. In situ X-ray reflectivity studies of HafSOx films deposited under different humidities reveal that, while the thickness varies significantly with humidity, the density of the as-deposited films is similar, suggesting that humidity primarily affects the relative amount of material deposited. Because reproducible film thickness is critical for many applications, our data highlight the importance of controlling humidity during spin-processing.