Application of tritium imaging plate technique to examine tritium behaviors on the surface and in the bulk of plasma-exposed materials
Application of tritium imaging plate technique to examine tritium behaviors on the surface and in the bulk of plasma-exposed materials
复制标题
应用氚成像板技术检查等离子体暴露材料表面和本体中的氚行为
DOI：
10.1016/j.jnucmat.2010.11.046
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发表时间：
2011
影响因子：
3.1
通讯作者：
T. Tanabe
中科院分区：
文献类型：
--
作者：
T. Otsuka;M. Shimada;R. Kolasinski;P. Calderoni;J. Sharpe;Y. Ueda;Y. Hatano;T. Tanabe
在线性等离子体实验装置中，应用氚成像板技术测量了不同金属材料在氘-氚等离子体照射后表面和内部的氚分布。用简单的氢扩散模型解释了各金属中氚在mm范围内的浓度分布。我们发现大量的氚集中在近表面区域，与扩散在大块中的氚有明显的区别。表面氚的量不太可能与体积性质（扩散性和溶解度）相关，但与表面缺陷或金属杂质（如氧化物和碳化物）的捕获有关。
We have applied a tritium imaging plate technique to measure the tritium distribution profile on surface and in bulk of various metal materials after exposure to a deuterium–tritium plasma in a linear plasma experimental apparatus. The experimental tritium concentration profiles in mm range are interpreted according to a simple hydrogen diffusion model in each metal. We found that a significant amount of tritium is localized in near surface regions and is clearly distinguishable from tritium diffused in the bulk. The amount of surface tritium is not likely correlated to bulk properties (diffusivity and solubility), but is related to trapping in surface defects or metal impurities such as oxide and carbide.