Writing waveguides in glass with a femtosecond laser
Writing waveguides in glass with a femtosecond laser
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DOI：
10.1364/ol.21.001729
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发表时间：
1996-11-01
期刊：
影响因子：
3.6
通讯作者：
Hirao, K
中科院分区：
文献类型：
--
作者：
Davis, KM;Miura, K;Hirao, K
为了能够为电信行业创造光学器件，我们研究了810 nm飞秒激光辐射对各种玻璃的影响。通过聚焦激光束通过显微镜物镜，我们成功地写了透明的，但可见的，圆椭圆形的损伤线内高硅，硼酸盐，钠钙硅酸盐，和氟锆酸盐（ZBLAN）散装玻璃。在纯的和Ge掺杂的二氧化硅玻璃中的损坏区域的显微椭圆偏振仪测量显示出0.01-0.035的折射率增加，这取决于辐射剂量。还发现了Si E'或Ge E'中心、非桥氧空穴中心和过氧自由基等缺陷的形成。这些结果表明，多光子相互作用发生在玻璃中，它可能会写在散装玻璃与这样的聚焦激光束技术的三维光学电路。(C)1996年美国光学学会
With the goal of being able to create optical devices for the telecommunications industry, we investigated the effects of 810-nm, femtosecond laser radiation on various glasses. By focusing the laser beam through a microscope objective, we successfully wrote transparent, but visible, round-elliptical damage lines inside high-silica, berate, soda lime silicate, and fluorozirconate (ZBLAN) bulk glasses. Microellipsometer measurements of the damaged region in the pure and Ge-doped silica glasses showed a 0.01-0.035 refractive-index increase, depending on the radiation dose. The formation of several defects, including Si E' or Ge E' centers, nonbridging oxygen hole centers, and peroxy radicals, was also detected. These results suggest that multiphoton interactions occur in the glasses and that it may be possible to write three-dimensional optical circuits in bulk glasses with such a focused laser beam technique. (C) 1996 Optical Society of America