STABILITY TO MOISTURE FOR CHEMICALLY VAPOUR-DEPOSITED BORON-NITRIDE

STABILITY TO MOISTURE FOR CHEMICALLY VAPOUR-DEPOSITED BORON-NITRIDE
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DOI:
10.1007/bf01174496
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发表时间:
1989-07-01
影响因子:
4.5
通讯作者:
MATSUDA, T
MATSUDA, T
中科院分区:
材料科学3区
文献类型:
--
作者:
MATSUDA, T

文献摘要

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研究了用BCl3-NH3-H_2气体体系制备的化学气相沉积氮化硼(CVD-BN)板材的耐湿性。采用红外光谱分析、化学分析和热重分析等方法进行了研究。CVD-BN板材的合成条件对其耐湿稳定性有很大影响。在10~60torr总气压下制备的CVD-BN板的稳定性随着沉积温度的降低而降低。在1400℃以下和10Torr以上制备的CVD-BN片材具有透明和各向同性,对湿气的稳定性较差,在5Torr下合成的CVD-BN片材具有很高的耐湿性,即使在1400°C以下也具有很高的耐湿性。红外吸收光谱研究表明,CVD-BN计划中存在的不稳定物种通过与大气中的水分反应而转变为水合硼酸铵。随着沉积粒子的倾斜,CVD-BN板材的耐湿稳定性下降,尤其是1400℃下制备的CVD-BN板材。
Chemically vapour-deposited boron nitride (CVD-BN) plates prepared by use of the BCl3-NH3-H2gas system were investigated as to their stability to moisture. Infrared (IR) spectroscopic measurement, chemical analysis and thermal gravimetric analysis were used in this study. The synthesis conditions of CVD-BN plates have a large influence on their stability to moisture. The stability of CVD-BN plates prepared under a total gas pressure (Ptot) of 10 to 60 torr degraded as the deposition temperature (Tdep) was lowered. The CVD-BN plates with transparent and isotropic properties, which were prepared at below 1400° C and above 10 torr, showed poor stability to moisture, The CVD-BN plates synthesized under 5 torr had high moisture-resistance, even at aTdepas low as 1400° C. An IR absorption spectral study revealed that the unstable species existing in CVD-BN plans had changed to ammonium borate hydrates by reacting with moisture in the atmosphere. The stability to moisture for CVD-BN plates degraded as the deposition roe was raked, especially for the CVD-BN plates prepared at 1400° C.