STABILITY TO MOISTURE FOR CHEMICALLY VAPOUR-DEPOSITED BORON-NITRIDE
STABILITY TO MOISTURE FOR CHEMICALLY VAPOUR-DEPOSITED BORON-NITRIDE
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DOI:
10.1007/bf01174496
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发表时间:
1989-07-01
影响因子:
4.5
通讯作者:
MATSUDA, T
中科院分区:
文献类型:
--
作者:
MATSUDA, T
Chemically vapour-deposited boron nitride (CVD-BN) plates prepared by use of the BCl3-NH3-H2gas system were investigated as to their stability to moisture. Infrared (IR) spectroscopic measurement, chemical analysis and thermal gravimetric analysis were used in this study. The synthesis conditions of CVD-BN plates have a large influence on their stability to moisture. The stability of CVD-BN plates prepared under a total gas pressure (Ptot) of 10 to 60 torr degraded as the deposition temperature (Tdep) was lowered. The CVD-BN plates with transparent and isotropic properties, which were prepared at below 1400° C and above 10 torr, showed poor stability to moisture, The CVD-BN plates synthesized under 5 torr had high moisture-resistance, even at aTdepas low as 1400° C. An IR absorption spectral study revealed that the unstable species existing in CVD-BN plans had changed to ammonium borate hydrates by reacting with moisture in the atmosphere. The stability to moisture for CVD-BN plates degraded as the deposition roe was raked, especially for the CVD-BN plates prepared at 1400° C.